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Purifier
Purifier

Purifier

The core equipment for efficiently removing impurities through physical or chemical separation techniques to enhance the purity of substances

  • Deep purification capacity
  • Anti-corrosion and pollution-free material
  • Modular and scene-adapted design
  • Efficient regeneration
  • Intelligent control and safety protection
  • Multi-functional integration
TypeTypical products/modelsPurify objectsPurification accuracyCore technical featuresMain application fields
Gas purifier9NS Series ultra-pure gas systemInert gases (such as He/Ar), O₂, H₂≤1 ppbDual technology of catalysis at room temperature and physical adsorption; PLC intelligent control Integrated 0.003μm particle filterSemiconductor manufacturing, photovoltaic industry, high-purity reagent production
PS2-GC50-R/N Rare Gas PurifierRare gases, nitrogenppbZirconium-aluminum getter technology Vertical installation to prevent leakage; Automatic fault detectionLaboratory carrier gas treatment, GC/MS analysis
Palladium diffusion hydrogen purifierHydrogen and mixed gases100.00%High-temperature palladium membrane selective hydrogen permeation Dew point ≤-65℃ A high-pressure processing capacity of 40Nm³/hCultivated diamonds, fuel cells, aerospace fuel
Acid purifierDHJ-8 series multi-functional systemAcid reagents such as HNO₃, HCl, and HF0.01 ppb(Metal impurities)PTFE/FEP material anti-corrosion; Sub-boiling distillation technology; PID temperature control ±1℃; Sealed anti-pollution designICP-MS detection, semiconductor cleaning, trace analysis
CH high-purity acid distillation systemLaboratory acid solutionMetal impurities≤0.01 ppbFully automatic anti-dry burning; No cooling water design; Teflon coating is corrosion-resistantDrug stability testing, environmental monitoring
Medical/scientific research purifierMetalIonPurifier (MIP)Photoresist, resin solutionPPT-level metal ionsMicrobed resin curing technology The single-pass removal rate is over 90% (Na⁺/K⁺). Deep paths extend the contact timeSemiconductor lithography process, high-purity material synthesis
AKTApure chromatography systemProtein, nucleic acidBiological grade purityModular chromatography column Real-time monitoring by Unicorn software; Supports purification from microgram to gram levelBiopharmaceuticals, vaccine research and development, gene sequencing
Special purifierUltra-pure ammonia purifierAmmonia gas(NH₃)9N(99.9999999%)Double-tower adsorption regeneration technology Remote automatic control Integrated particle filtrationMOCVD equipment, LED epitaxial wafer growth
Helium low-temperature purifierIndustrial helium gas100.00%Deep cryogenic adsorption at -253℃ Resistant to N₂/O₂ pollution; Megawatt-level compressor matchingSuperconducting accelerator, nuclear magnetic resonance cooling system
TypeCore parametersTypical values/rangesTechnical focus
Acid purifierMaterialAll PTFE/FEP Teflon materialCorrosion-resistant, zero metal contamination, blank value≤0.01ppb
Temperature control accuracy±1℃(Room temperature-200℃)PID temperature control, sub-boiling distillation explosion-proof boiling
Acid production rate30-50ml/h(Nitric acid/hydrochloric acid)Automatic acid addition, waste liquid discharge, and dry-burning protection
Impurity removal rateMetal ion ≤0.01ppb (single distillation)Closed purification to prevent secondary environmental pollution
Gas purifierHydrogen purity≥99.99999%(Palladium diffusion technology)Selective hydrogen permeation of palladium membrane, outlet O₂≤0.001ppm
Dew point control≤-65℃(corresponding to H₂O≤0.5ppm)Adsorbent alloy water removal, dew point sensor monitoring
Flow range0.01-199 SLM(Standard litres/min)Pressure drop ≤0.3% RSD, anti-gas turbulence
Work pressure≤1000 psig(Approximately 6.9MPa)Oil-free seal, high-pressure resistant design
Argon/nitrogen purifierOutput purity99.99995%(O₂≤0.01ppm)Dual-bed structure (alumina + molecular sieve)
Processing capacity4m³/h(Argon gasPSA pressure swing adsorption, automatic regeneration cycle
Energy consumptionCatalytic tower 0.8kW, with the same consumption during regenerationModular design, supporting remote monitoring
Medical/chromatographic purificationRange of pressure≥40MPa(400bar)High-pressure binary mixed gradient, preventing cross-contamination
Recycling accuracyComponent recovery volume ≥40mL7Multi-mode triggering based on time/chromatographic peak/mass number
Detection limitUV detection: 200-600nm, ELSD carrier gas purity: 99.999%The optical path of the flow cell is 0.2-0.4mm, which is suitable for mass spectrometry


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